Chemical vapour deposition of tantalum suicide thin films from difluorosilylene and tantalum halides

Journal of Materials Chemistry

Volumn 6, Issue 7, 1996, Pages 1131-1133

  Lee, C Y ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000434389     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/jm9960601131     Document Type: Article

References (4)

1. S. P. Murarka, Suicides for VLSI Applications, Academic Press, New York, 1983, ch. 1.
2. J. M. Andrews, J. Vac. Sci. Technol., 1974, 11, 972.
3. B. J. Aylett, J. Chem. Soc., Dalton Trans., 1977, 2058.
4. C. C. Chen, J. L. Yu, C. Y. Lee, C. S. Liu and H. T. Chiu, J. Mater. Chem., 1992, 2, 983.