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Volumn 128, Issue 12, 1981, Pages 2660-2665
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The Deposition of Silicon Films by Pyrolytic Decomposition of SiF2 Gas
a a a a |
Author keywords
amorphous Si:F; CVD kinetics; polymerization; thin films
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Indexed keywords
FILMS - PREPARATION;
SEMICONDUCTING SILICON;
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EID: 0019697745
PISSN: 00134651
EISSN: 19457111
Source Type: Journal
DOI: 10.1149/1.2127324 Document Type: Article |
Times cited : (14)
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References (11)
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