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Journal of Chemical Physics

Volumn 109, Issue 23, 1998, Pages 10111-10114

Defect evolution in ultrathin films of polystyrene-block-polymethylmethacrylate diblock copolymers observed by atomic force microscopy

(4) Hahm, J a Lopes, W A a Jaeger, H M a Sibener, S J a

a UNIVERSITY OF CHICAGO (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001573951 PISSN: 00219606 EISSN: None Source Type: Journal
DOI: 10.1063/1.477702 Document Type: Article

Times cited : (98)

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