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Applied Physics A: Materials Science and Processing

Volumn 69, Issue 4, 1999, Pages 427-431

Preparation of P-rich InP surfaces via MOCVD and surface characterization in UHV

(6) Hannappel, T a Visbeck, S a Knorr, K a,b Mahrt, J a Zorn, M b Willig, F a

a HAHN MEITNER INSTITUT (Germany)

b TECHNISCHE UNIVERSITÄT BERLIN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; EPITAXIAL GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOSPHORUS; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR GROWTH;

REFLECTANCE ANISOTROPY SPECTROSCOPY (RAS);

SEMICONDUCTING FILMS;

EID: 0032691971 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390051026 Document Type: Article

Times cited : (35)

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