SCOPUS 정보 검색 플랫폼

Electrochemical Society Interface

Volumn 8, Issue 2, 1999, Pages 26-30

High and low dielectric constant materials

(2) Singh, R a,b Ulrich, R K c,d

a Holcombe Dept Elec and Comp Eng (United States)

b CLEMSON UNIVERSITY (United States)

c UNIVERSITY OF ARKANSAS (United States)

d High Density Electronics Center (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING (CMP); INTERLEVEL DIELECTRICS (ILD); INTERMETAL DIELECTRICS (IMD); RAPID PHOTOTHERMAL CHEMICAL VAPOR DEPOSITION (RPCVD);

CRYSTAL MICROSTRUCTURE; DYNAMIC RANDOM ACCESS STORAGE; INTEGRATED CIRCUIT MANUFACTURE; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOSFET DEVICES; PERMITTIVITY; PEROVSKITE; SILICON; STRONTIUM COMPOUNDS; SURFACE ROUGHNESS; THERMAL STRESS;

DIELECTRIC FILMS;

EID: 0032675911 PISSN: 10648208 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (85)

References (14)

1
- 0032208242
- R. Kyoung, K. Sojin and J H. Koo, J. Am. Ceram. Soc., 81, 2998 (1998).
- (1998) J. Am. Ceram. Soc. , vol.81 , pp. 2998
- Kyoung, R.¹ Sojin, K.² Koo, J.H.³

2
- 0032156785
- R. Singh, Microelectronics Reliability, 38, 1471 (1998).
- (1998) Microelectronics Reliability , vol.38 , pp. 1471
- Singh, R.¹

3
- 0002427089
- S. P. DeOrnellas and A. Cofer, Solid State Technology, 41, 53 (1998).
- (1998) Solid State Technology , vol.41 , pp. 53
- DeOrnellas, S.P.¹ Cofer, A.²

4
- 0018334149
- R. Singh and K. Rajkanan, J. Vac. Sci. Technol., 17, 376 (1980).
- (1980) J. Vac. Sci. Technol. , vol.17 , pp. 376
- Singh, R.¹ Rajkanan, K.²

5
- 0030105752
- H. Shimada, and T. Ohmi, IEEE Trans. Electron. Devices, 43, 431 (1996).
- (1996) IEEE Trans. Electron. Devices , vol.43 , pp. 431
- Shimada, H.¹ Ohmi, T.²

6
- 0032255112
- T. Devoivre, C. Papadas, M. Setton, N. Sandler, L. Vallier, and I. Bouras, Proc. 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conf., p. 434 (1988).
- (1988) Proc. 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conf. , pp. 434
- Devoivre, T.¹ Papadas, C.² Setton, M.³ Sandler, N.⁴ Vallier, L.⁵ Bouras, I.⁶

7
- 0032026492
- R. Singh, S. V. Nimmagadda, V. Parihar, Y. Chen, and K. F. Poole, IEEE Trans. Electron. Devices, 45, 643 (1998).
- (1998) IEEE Trans. Electron. Devices , vol.45 , pp. 643
- Singh, R.¹ Nimmagadda, S.V.² Parihar, V.³ Chen, Y.⁴ Poole, K.F.⁵

8
- 0033525158
- C. D. Dimtrakopoulos, S. Purushothaman, J. Kymissis, A Callegari, and J. M. Shaw, Science, 283, 822 (1999).
- (1999) Science , vol.283 , pp. 822
- Dimtrakopoulos, C.D.¹ Purushothaman, S.² Kymissis, J.³ Callegari, A.⁴ Shaw, J.M.⁵

9
- 0003552056
- Semiconductor Industry Association
- The National Technology Roadmap for Semiconductors, Semiconductor Industry Association, p. 11, 1997.
- (1997) The National Technology Roadmap for Semiconductors , pp. 11

10
- 6544240185
- M A. Wait, J. Mavoori, R Singh, J E Harriss, K. F. Poole, J. W. Kolis, R. P. S Thakur, and A. A. Ogale, Appl. Phys. Lett., 64, 3264 (1994)
- (1994) Appl. Phys. Lett. , vol.64 , pp. 3264
- Wait, M.A.¹ Mavoori, J.² Singh, R.³ Harriss, J.E.⁴ Poole, K.F.⁵ Kolis, J.W.⁶ Thakur, R.P.S.⁷ Ogale, A.A.⁸

11
- 0000521933
- R. Sharangpani and R. Singh, Rev. Sci. Instruments, 68, 1564 (1997).
- (1997) Rev. Sci. Instruments , vol.68 , pp. 1564
- Sharangpani, R.¹ Singh, R.²

12
- 0001842957
- B. Shieh, K. Saraswat, M Deal, and J. McVittie, Solid State Technology, 42 (2), 51 (1999).
- (1999) Solid State Technology , vol.42 , Issue.2 , pp. 51
- Shieh, B.¹ Saraswat, K.² Deal, M.³ McVittie, J.⁴

13
- 0742290429
- P. Singer, Semiconductor International, 22 (3), 38 (1999).
- (1999) Semiconductor International , vol.22 , Issue.3 , pp. 38
- Singer, P.¹

14
- 0004329197
- R. Singh, V. Parihar, K. F. Poole, and K. Rajkanan, Semiconductor Fabtech , 9, 223 (1999).
- (1999) Semiconductor Fabtech , vol.9 , pp. 223
- Singh, R.¹ Parihar, V.² Poole, K.F.³ Rajkanan, K.⁴

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