Adsorption and reaction of NO on Si(111) studied by scanning tunneling microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 1051-1054

  Rottger B ^a   Kliese, R ^a   Neddermeyer, H ^a  

^a MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001459640     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588398     Document Type: Article

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