Nanometer scale selective etching of Si(111) surface using silicon nitride islands

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 5, 1998, Pages 2806-2810

  Ha, Jeong Sook ^a   Park, Kang Ho ^a   Yun, Wan Soo ^a   Lee, El Hang ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007088383     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590238     Document Type: Article

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