Neural networks for the simulation of photoresist exposure process in integrated circuit fabrication

Modelling and Simulation in Materials Science and Engineering

Volumn 5, Issue 5, 1997, Pages 439-450

  Mardiris, V ^a   Karafyllidis, I ^a   Soudris, D ^a   Thanailakis, A ^a  

^a DEMOCRITUS UNIVERSITY OF THRACE   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

AUTOMATA THEORY; BACKPROPAGATION; COMPUTER SIMULATION; ETCHING; INTEGRATED CIRCUIT MANUFACTURE; LEARNING SYSTEMS; PHOTORESISTS;

PHOTOLITHOGRAPHIC RESIST EXPOSURE PROCESS;

FEEDFORWARD NEURAL NETWORKS;

EID: 0031219706     PISSN: 09650393     EISSN: None     Source Type: Journal    
DOI: 10.1088/0965-0393/5/5/001     Document Type: Article

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