Total TCAD strategy for DFM in IC technology development

IEE Proceedings: Science, Measurement and Technology

Volumn 144, Issue 2, 1997, Pages 63-68

  Walton, A J ^a   Fallon, M ^a   Newsam, M I ^a   Ferguson, R S ^b   Sprevak, D ^b   Elliott, J P ^a   Allan, G A ^a  

^a UNIVERSITY OF EDINBURGH   (United Kingdom)

^b QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

Design for manufacturability; DOE; IC technology; Process and device simulation; RSM; Technology CAD

Indexed keywords

COMPUTER AIDED DESIGN; COMPUTER AIDED MANUFACTURING; COMPUTER SIMULATION; OPTIMIZATION; STATISTICAL METHODS;

DESIGN FOR MANUFACTURABILITY (DFM) METHOD; DESIGN OF EXPERIMENTS (DOE); RESPONSE SURFACE METHODOLOGY (RSM);

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0031097212     PISSN: 13502344     EISSN: None     Source Type: Journal    
DOI: 10.1049/ip-smt:19970860     Document Type: Article

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