Effect of bias voltage on AlN thin films prepared by electron shower method

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 321-323

  Ishihara, M ^a   Yumoto, H ^a   Tsuchiya, T ^a   Akashi, K ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Aluminium nitride; Atomic force microscopy (AFM); X ray diffraction; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; COMPOSITION; ELECTRIC FIELD EFFECTS; FILM PREPARATION; OXYGEN; SPUTTERING; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM NITRIDE; ELECTRON SHOWER METHOD; ION PLATING; NEGATIVE BIAS VOLTAGE;

THIN FILMS;

EID: 13544250169     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08636-1     Document Type: Article

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