Growth of AlN thin films on (111) and (100) silicon by pulsed laser deposition in nitrogen plasma ambient

Diamond and Related Materials

Volumn 6, Issue 8, 1997, Pages 1015-1018

  Ogawa, Tetsuya ^a   Okamoto, Mitsuo ^a   Khin, Yap Yoke ^a   Mori, Yusuke ^a   Hatta, Akimitsu ^a   Ito, Toshimichi ^a   Sasaki, Takatomo ^a   Hiraki, Akio ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Aln thin film; Cathodoluminescence; FTIR; Pulsed laser deposition; X ray diffraction

Indexed keywords

EID: 0004765073     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(96)00746-7     Document Type: Article

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