Low temperature fabrication of amorphous silicon thin film transistors by dc reactive magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2770-2776

  McCormick, C S ^a   Weber, C E ^a   Abelson, J R ^a   Davis, G A ^b   Weiss, R E ^b   Aebi, V ^b  

^a University of Illinois at Urbana Champaign   (United States)

^b Intevac Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031516766     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580821     Document Type: Article

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