Amorphous and microcrystalline silicon films obtained by hot-wire chemical vapour deposition using high filament temperatures between 1900 and 2500°C

Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties

Volumn 76, Issue 3, 1997, Pages 299-308

  Conde, J P ^a   Brogueira, P ^a   Chu, V ^b  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^b INESC   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001351244     PISSN: 13642812     EISSN: None     Source Type: Journal    
DOI: 10.1080/01418639708241095     Document Type: Article

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