Growth of micro-crystalline Si:H and (Si,Ge):H on polyimide substrates using ECR deposition techniques

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 409-413

  Erickson, Karl ^a   Dalal, Vikram L ^a   Chumanov, George ^a  

^a IOWA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CRYSTAL STRUCTURE; ELECTRON CYCLOTRON RESONANCE; ENERGY ABSORPTION; FILM GROWTH; HYDROGENATION; ION BOMBARDMENT; PHASE TRANSITIONS; POLYIMIDES; RAMAN SPECTROSCOPY;

GERMANE; LOW ENERGY ABSORPTION COEFFICIENT; MICROCRYSTALLINITY;

SEMICONDUCTING SILICON;

EID: 0031361446     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-409     Document Type: Conference Paper

References (10)