Recent developments in hot wire amorphous silicon

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 23-28

  Crandall, Richard S ^a   Liu, Xiao ^b   Iwaniczko, Eugene ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b Laboratory of Atomic and Solid State Physics and Sibley School of Mechanical and Aerospace Engineering   (United States)

Author keywords

Amorphous silicon; Chemical vapor deposition; Internal friction

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; ELECTRON BEAMS; FREEZING; HYDROGENATION; INTERNAL FRICTION; THERMAL EFFECTS;

FREEZING POINT; HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

AMORPHOUS SILICON;

EID: 0032065211     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00327-5     Document Type: Article

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