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Volumn 10, Issue 8, 1998, Pages 574-577

The use of soft lithography to fabricate arrays of Schottky diode

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; MOLDING; SCHOTTKY BARRIER DIODES; SEMICONDUCTING SILICON;

EID: 0032474408     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1521-4095(199805)10:8<574::aid-adma574>3.0.co;2-d     Document Type: Article
Times cited : (35)

References (21)
  • 15
    • 85088542911 scopus 로고    scopus 로고
    • 2
    • 2.
  • 20
    • 85088542842 scopus 로고    scopus 로고
    • bi are two constants related to doping concentration and Schottky barrier height
    • bi are two constants related to doping concentration and Schottky barrier height.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.