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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3426, Issue , 1998, Pages 160-168

Polarization of out-of-plane optical scatter from SiO2 films grown on photolithographically-generated microrough silicon

(2) Germer, Thomas A a Scheer, Bradley W a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

Author keywords

Bidirectional ellipsometry; Dielectric films; Microroughness; Polarimetry; Scatter; Surfaces

Indexed keywords

DIELECTRIC FILMS; ELLIPSOMETRY; FILM GROWTH; LIGHT POLARIZATION; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; POLARIMETERS; SILICA; SILICON; SURFACE ROUGHNESS;

BIDIRECTIONAL ELLIPSOMETRY;

LIGHT SCATTERING;

EID: 0032225429 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.328451 Document Type: Conference Paper

Times cited : (2)

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