Application of bidirectional ellipsometry to the characterization of roughness and defects in dielectric layers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3275, Issue , 1998, Pages 121-131

  Germer, Thomas A ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Bidirectional ellipsometry; Defects; Dielectric films; Microroughness; Polarimetry; Scatter; Surfaces

Indexed keywords

CHARACTERIZATION; DIELECTRIC FILMS; ELLIPSOMETRY; LIGHT POLARIZATION; MATRIX ALGEBRA; SILICON; SUBSTRATES;

BIDIRECTIONAL ELLIPSOMETRY;

LIGHT SCATTERING;

EID: 0032390716     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.304397     Document Type: Conference Paper

References (14)

1. Angular dependence and polarization of out-of-plane optical scattering from particulate contamination, subsurface defects, and surface microroughness
2. Bidirectional ellipsometry and its application to the characterization of surfaces
3. Polarization of out-of-plane scattering from microrough silicon
4. Multilayer-coated optics: Guided-wave coupling and scattering by means of interface random roughness
5. Light scattering from multilayer optics: Comparison of theory and experiment
6. Diffraction and diffuse scattering from dielectric multilayers
7. Infrared light scattering from surfaces covered with multiple dielectric overlayers
8. Light scattering from surfaces with a single dielectric overlayer