Development of a physical haze and microroughness standard

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2862, Issue , 1996, Pages 78-95

  Scheer, Bradley W ^a  

^a VLSI Research Inc   (United States)

Author keywords

Atomic force microscopy; Bi directional reflectance distribution function (BRDF); Haze; Microroughness; Power spectral density function (PSD); Profilometry; Scanning surface inspection system; Scatterometry; Surface texture; Wafer scanner

Indexed keywords

ATOMIC FORCE MICROSCOPY; BONDING; DIGITAL STORAGE; DISTRIBUTION FUNCTIONS; ELECTRIC INSULATORS; ETCHING; FLAT PANEL DISPLAYS; INSPECTION EQUIPMENT; LAPTOP COMPUTERS; LIGHT SCATTERING; PHOTOMASKS; POWER SPECTRAL DENSITY; PROFILOMETRY; SCANNING; SILICA; SILICON ON INSULATOR TECHNOLOGY; SLIP FORMING; SPECTRAL DENSITY; STICK-SLIP; SURFACE ROUGHNESS; TEXTURES; WAFER BONDING;

BIDIRECTIONAL REFLECTANCE DISTRIBUTION FUNCTIONS; HAZE; MICRO-ROUGHNESS; SCATTEROMETRY; SURFACE INSPECTION SYSTEM; SURFACE TEXTURES; WAFER SCANNER;

SILICON WAFERS;

EID: 0003019754     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.256193     Document Type: Conference Paper

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