Bidirectional ellipsometry and its application to the characterization of surfaces

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3121, Issue , 1997, Pages 173-182

  Germer, Thomas A ^a   Asmail, Clara C ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Microroughness; Polarimetry; Scatter; Subsurface defects; Surfaces

Indexed keywords

FUSED SILICA; GLASS CERAMICS; LIGHT POLARIZATION; LIGHT SCATTERING; POLARIMETERS; SILICON; SURFACE ROUGHNESS;

SUBSURFACE DEFECTS;

ELLIPSOMETRY;

EID: 0031288799     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.278968     Document Type: Conference Paper

References (20)

1. Optical scattering in the optics, semiconductor, and computer disk industries
2. Flatness, roughness, and discrete defect characterization for computer disks, wafers, and flat panel displays
3. Scattering by one-dimensional random rough metallic surfaces in a conical configuration: Several polarizations
4. Mueller matrix scatter polarimetry of a diamond-turned mirror
5. Surface haze in the Stokes-Mueller representation
6. Statistics of the polarization properties of one-dimensional randomly rough surfaces
7. Polarization of specular reflection and near-specular scattering by a rough surface
8. Instrumentation at the national institute of standards and technology for bidirectional reflectance distribution function (BRDF) measurements
9. Photopolarimetric measurement of the Mueller matrix by Fourier analysis of a single detected signal
10. Polarimetry
11. Development of a physical haze and microroughness standard
12. Status of bidirectional reflectance distribution function (BRDF) calibration standards development