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Volumn 188, Issue 1-4, 1998, Pages 197-204

Nanoscale Si selective homoepitaxial growth observed by scanning tunneling microscopy

Author keywords

Chemical beam epitaxy; Faceting; Scanning tunneling microscopy; Silane; Silicon; Silicon oxide

Indexed keywords

CHEMICAL BEAM EPITAXY; NANOSTRUCTURED MATERIALS; PASSIVATION; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTOR GROWTH; SILANES; SILICA; THERMOOXIDATION;

EID: 0032099593     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)00054-2     Document Type: Article
Times cited : (3)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.