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Volumn 188, Issue 1-4, 1998, Pages 197-204
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Nanoscale Si selective homoepitaxial growth observed by scanning tunneling microscopy
c
NEC CORPORATION
(Japan)
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Author keywords
Chemical beam epitaxy; Faceting; Scanning tunneling microscopy; Silane; Silicon; Silicon oxide
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Indexed keywords
CHEMICAL BEAM EPITAXY;
NANOSTRUCTURED MATERIALS;
PASSIVATION;
SCANNING TUNNELING MICROSCOPY;
SEMICONDUCTOR GROWTH;
SILANES;
SILICA;
THERMOOXIDATION;
DISILANES;
SELECTIVE EPITAXIAL GROWTH;
SEMICONDUCTING SILICON;
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EID: 0032099593
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(98)00054-2 Document Type: Article |
Times cited : (3)
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References (22)
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