Deposition of high quality SiO2 films using TEOS by ECR plasma

Materials Research Society Symposium - Proceedings

Volumn 396, Issue , 1996, Pages 539-543

  Sano, K ^a   Tamamaki, H ^a   Nomura, M ^a   Wickramanayaka, S ^a   Nakanishi, Y ^a   Hatanaka, Y ^a  

^a SUZUKI MOTOR CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON CYCLOTRON RESONANCE; FILM PREPARATION; MICROWAVES; OXYGEN; PLASMA APPLICATIONS; QUALITY CONTROL; TEMPERATURE; THIN FILMS;

APPLIED MICROWAVE POWER; MESH VOLTAGE; OPTIMUM DEPOSITION RATE; PLASMA GAS; TETRAETHOXYSILANE;

SILICA;

EID: 0029694657     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)