Plasma homo- and copolymerizations of tetrafluoroethylene and chlorotrifluoroethylene

Plasmas and Polymers

Volumn 1, Issue 2, 1996, Pages 173-194

  Golub, Morton A ^a   Wydeven, Theodore ^a   Finney, Lorie S ^b  

^a NASA AMES RESEARCH CENTER   (United States)

^b Surface Science Lab   (United States)

Author keywords

Chlorotrifluoroethylene; Deposition rates; Infrared spectroscopy; Plasma copolymerization; Plasma polymerization; Plasma process parameters; Tetrafluoroethylene; X ray photoelectron spectroscopy

Indexed keywords

CHEMICAL REACTORS; CHLORINE COMPOUNDS; COPOLYMERIZATION; COPOLYMERS; DEPOSITION; FLUORINE COMPOUNDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROGRAVITY PROCESSING; MOLECULAR WEIGHT; X RAY PHOTOELECTRON SPECTROSCOPY;

CHLOROTRIFLUOROETHYLENE; DEPOSITION RATE; PLASMA HOMOPOLYMERS; TETRAFLUOROETHYLENE;

PLASMA APPLICATIONS;

EID: 0030166127     PISSN: 10840184     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02532825     Document Type: Article

References (3)

1. H. Yasuda, Plasma Polymerization, Academic Press, Orlando, Florida (1985).
2. J. R. Hollahan, T. Wydeven, and C. C. Johnson, Appl. Opt. 13, 1844 (1974).
3. T. Wydeven and C. C. Johnson, Polym. Eng. Sci. 21, 650 (1981).