Oxynitridation of silicon and postnitridation of thermal silicon oxide in N2O in a vertical furnace

Journal of the Electrochemical Society

Volumn 144, Issue 10, 1997, Pages 3650-3657

  Lange, P ^a   Boness H ^a   Hendriks, M ^b  

^a Fraunhofer Inst F S   (Germany)

^b ASM International NV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FLOW OF FLUIDS; INDUSTRIAL FURNACES; NITROGEN OXIDES; REACTION KINETICS; SILICA; SILICON;

OXYNITRIDATION;

OXIDATION;

EID: 0031248518     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838064     Document Type: Article

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