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Volumn 8, Issue 4, 1987, Pages 140-142

Accelerated Testing of Time-Dependent Breakdown of SiO2

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICES, MOS - ELECTRIC BREAKDOWN; SILICA;

EID: 0023327250     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/EDL.1987.26580     Document Type: Article
Times cited : (39)

References (13)
  • 1
    • 0018727292 scopus 로고    scopus 로고
    • Method of determining reliability screens for time dependent dielectric breakdown
    • D. L. Crook, “Method of determining reliability screens for time dependent dielectric breakdown,” in Proc. 1979 Int. Rel. Phys. Symp. (IRPS), p. 1.
    • Proc. 1979 Int. Rel. Phys. Symp. (IRPS) , pp. 1
    • Crook, D.L.1
  • 6
    • 0022305759 scopus 로고    scopus 로고
    • High capacitance ultra-thin Ta2O5 dielectric film applied to a high-speed bipolar memory cell
    • Y. Nishioka et al., “High capacitance ultra-thin Ta 2 O 5 dielectric film applied to a high-speed bipolar memory cell,” in Tech. Dig. 1985 IEDM, p. 42.
    • Tech. Dig. 1985 IEDM , pp. 42
    • Nishioka, Y.1
  • 8
    • 84941504025 scopus 로고
    • Electrical breakdown in thin gate and tunneling oxides
    • Feb.
    • I. C. Chen, S. Holland, and C. Hu, “Electrical breakdown in thin gate and tunneling oxides,” IEEE Trans. Electron Devices, vol. ED-32, no. 2, p. 413, Feb. 1985.
    • (1985) IEEE Trans. Electron Devices , vol.ED-32 , Issue.2 , pp. 413
    • Chen, I.C.1    Holland, S.2    Hu, C.3
  • 10
    • 0017679232 scopus 로고
    • Current runaway in insulators affected by impact ionization and drift
    • Dec.
    • N. Klein and P. Solomon, “Current runaway in insulators affected by impact ionization and drift,” J. Appl. Phys., vol. 48, no. 12, p. 5217. Dec. 1977.
    • (1977) J. Appl. Phys , vol.48 , Issue.12 , pp. 5217
    • Klein, N.1    Solomon, P.2
  • 12
    • 0022101997 scopus 로고
    • Measurement of Fowler-Nordheim tunneling current in MOS structures under charge trapping conditions
    • Y. Nissan-Cohen, J. Shappir, and D. Frohman-Bentchkowsky, “Measurement of Fowler-Nordheim tunneling current in MOS structures under charge trapping conditions,” Solid-State Electron., vol. 28. no. 7, p. 717, 1985.
    • (1985) Solid-State Electron , vol.28 , Issue.7 , pp. 717
    • Nissan-Cohen, Y.1    Shappir, J.2    Frohman-Bentchkowsky, D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.