Capacitance-Voltage Characterization of LPCVD-Silicon Oxynitride Films

Physica Status Solidi (A) Applied Research

Volumn 187, Issue 2, 2001, Pages 493-498

  Szekeres, A ^a   Alexandrova, S ^a   Modreanu, M ^b  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012270662     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(200110)187:2<493::AID-PSSA493>3.0.CO;2-6     Document Type: Article

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