T-top forming simulation using percolation theory

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2610-2615

  Kamon, K ^a,b   Nakazawa, K ^a,c   Yamaguchi, A ^a,d   Matsuzawa, N ^a,e   Ohfuji, T ^a,f   Kanzaki, K ^a,g   Tagawa, S ^a,g  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

^c TOSHIBA CORPORATION   (Japan)

^d HITACHI LTD   (Japan)

^e SONY CORPORATION   (Japan)

^f NEC CORPORATION   (Japan)

^g OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001474460     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589694     Document Type: Article

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