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Volumn 12, Issue 4, 1999, Pages 577-582

Critical-dimension control for 130-nm patterns in x-ray lithography

Author keywords

130 nm; Critical dimension control; X ray lithography

Indexed keywords

EID: 0006740703 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.12.577 Document Type: Article

Times cited : (1)

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