An x-ray exposure system for 100-nm-order SR lithography

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 263-266

  Tsuyuzaki, H ^a   Fukuda, M ^a   Suzuki, M ^a   Kaneko, T ^a   Takeuchi, N ^a   Kanai, M ^b  

^a NTT CORPORATION   (Japan)

^b NTT Advanced Technology Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN; NANOTECHNOLOGY; SYNCHROTRON RADIATION; TESTING;

X RAY EXPOSURE SYSTEM;

X RAY LITHOGRAPHY;

EID: 12844267105     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00060-4     Document Type: Article

References (3)

1. S. Ishihara, M. Suzuki, M. Kanai and M. Fukuda: Microelectronic Engineering. 17(1992)141-144.
2. K. Deguchi, K. Miyoshi, H. Ban, T. Matsuda, T. Ohno, and Y. Kado: J. Vac. Sci. Technol. B13(6)Nov/Dec(1995).
3. J. P. Silverman, R. P. Rippstein, and J. M. Oberschmidt: IBM J. RES. DEVELOP., Vol. 37, No. 3, May 1993.