Critical dimension control in synchrotron radiation lithography using a negative-tone chemical amplification resist

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7591-7596

  Sumitani, Hiroaki ^a   Watanabe, Hiroshi ^a   Itoga, Kenji ^a   Hifumi, Takashi ^a   Suita, Muneyoshi ^a   Ogushi, Nobuaki ^b   Mizusawa, Nobutoshi ^b   Uda, Koji ^b  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b CANON INC   (Japan)

Author keywords

Chemically amplification resist; Critical dimension; Exposure dosage; Synchrotron radiation lithography; X ray mask

Indexed keywords

AMPLIFICATION; CONTROLLABILITY; MASKS; PHOTORESISTS; SYNCHROTRON RADIATION;

CRITICAL DIMENSION CONTROL; POST EXPOSURE DELAY (PED) TIME;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031343238     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7591     Document Type: Article

References (12)

1. H. Sumitani, K. Itoga, M. Inoue, H. Watanabe, N. Yamamoto, K. Marumoto and Y. Matsui: Proc. SPIE 2437 (1995) 94.
2. H. Maehara, T. Miyachi, Y. Watanabe, H. Sumitani and H. Watanabe: Dig. Pap., 9th Int. Micro Process Conf., Kitakyushu, 1996 (Bussiness Center for Academic Society Japan, Tokyo, 1996) p. 106.
3. K. Deguchi, K. Miyoshi, H. Ban, T. Matsuda, T. Ohno and Y. Kado: J. Vac. Sci. Technol. B 13 (1995) 3040.
4. Y. Nishioka, K. Shiozawa, T. Oishi, K. Kanamoto, Y. Tokuda, H. Sumitani, S. Aya, H. Yabe, K. Itoga, T. Hifumi, K. Marumoto, T. Kuroiwa, T. Kawahara, T. Nishikawa, T. Oomori, T. Fujino, S. Yamamoto, S. Uzawa, M. Kimata, M. Nunoshita and H. Abe: Int. Electron Device Meet. Tech. Dig. (IEEE, New York, 1995) p. 903.
5. A. C. Lamberti, P. Agnello, E. Crabbe, R. D. Guardia, J. Oberschmidt, S. Subbanna and S. Wu: Proc. SPIE 2723 (1996) 237.
6. H. Sumitani, K. Itoga, H. Shimano, S. Aya, H. Yabe, T. Hifumi, H. Watanabe, K. Kise, M. Inoue, K. Marumoto, Y. Nishioka, H. Abe, N. Mizusawa, K. Saitoh, Y. Fukuda and S. Uzawa: Proc. SPIE 2723 (1996) 222.
7. S. Hector, W. Chu, M. Thompson, V. Pol, B. Dauksher, K. Cummings, D. Resnick, S. Pendharkar, J. Maldonado, M. McCord, A. Krasnoperova, L. Liebmann, J. Silverman, J. Guo, M. Khan, S. Bollepalli, L. Capodieci and F. Cerrina: J. Vac. Sci. Technol. B 14 (1996) 4288.
8. K. Deguchi, K. Miyoshi, M. Oda, T. Matsuda, A. Ozawa and H. Yoshihara: J. Vac. Sci. Technol. B 14 (1996) 4294.
9. N. Mizusawa, Y. Watanabe, S. Hara, K. Saitoh, H. Maehara, M. Amemiya and S. Uzawa: Dig. Papers, Photomask Japan, 1997, p. 86.
10. K. Saitoh, H. Ohsawa, K. Sentoku, T. Matsumoto, N. Mizusawa, Y. Fukuda, K. Uda, H. Sumitani and T. Hifumi: J. Vac. Sci. Technol. B 14 (1996) 4303.
11. K. Kise, S. Aya, H. Yabe, K. Kitamura and K. Marumoto: Dig. Pap., 1997 Int. Microprocesses & Nanotechnologyy Conf., Nagoya (Bussiness Center for Academic Society Japan, Tokyo, 1997) p. 70.
12. Y. Watanabe, S. Hara, N. Mizusawa, Y. Fukuda and S. Uzawa: Abstr. Book, 41 st Int. Conf. Electron and Photon Beam Technology and Nanofabrication, 1997, p. 30.