An effective emissivity model for rapid thermal processing using the net-radiation method

International Journal of Thermophysics

Volumn 22, Issue 5, 2001, Pages 1563-1575

  Zhang, Z M ^a   Zhou, Y H ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

Effective emissivity; Enclosure model; Net radiation method; Radiometric temperature measurement; Rapid thermal processing

Indexed keywords

EID: 0006475517     PISSN: 0195928X     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1012865609265     Document Type: Article

References (27)

1. F. Roozeboom, J. Vac. Sci. Technol. 58:1249 (1990).
2. P. J. Timans, Mater. Sci. Semicond. Process. 1:169 (1998).
3. F. Roozeboom (ed.), Advances in Thermal and Integrated Processing (Kluwer Academic, Dordrecht, 1996).
4. P. J. Timans, Solid State Technol. 40:63 (1997).
5. D. P. DeWitt, F. Y. Sorrel, and J. K. Elliott, Mater. Res. Soc. Symp. Proc. 470:3 (1997).
6. Z. M. Zhang, in Annual Review of Heat Transfer, C. L. Tien, ed. (Begell House, New York, 2000), Vol. 11, Chap. 6.
7. P. Vandenabeele and K. Maex, J. Appl. Phys. 72:5967 (1992).
8. P. Y. Wong, C. K. Hess, and I. N. Miaoulis, Opt. Eng. 34:1776 (1995).
9. J. P. Hebb and K. F. Jensen, J. Electrochem. Soc. 143:1142 (1996).
10. N. M. Ravindra, S. Abedrabbo, W. Chen, F. M. Tong, A. K. Nanda, and A. C. Speranza, IEEE Trans. Semicond. Manuf. 11:30 (1998).
11. A. Acharya and P. J. Timans, Mater. Res. Soc. Symp. Proc. 525:21 (1998).
12. B. K. Tsai and D. P. DeWitt, in Seventh Int. Conf. Adv. Therm. Process, of Semicond.-RTP '99, Colorado Springs, CO (1999), pp. 125-135;
13. C. W. Meyer, D. W. Allen, D. P. DeWitt, K. G. Kreider, F. L. Lovas, and B. K. Tsai, in RTP '99, pp. 136-141.
14. R. E. Bedford and C. K. Ma, J. Opt. Soc. Am. 64:339 (1974);
15. R. E. Bedford and C. K. Ma, J. Opt. Soc. Am. 65:565 (1975);
16. R. E. Bedford and C. K. Ma, J. Opt. Soc. Am. 66:724 (1976).
17. Z. Chu, Y. Sun, R. E. Bedford, and C. K. Ma, Appl. Opt. 25:4343 (1986).
18. A. Ono, J. Opt. Soc. Am. 70:547 (1980).
19. Z. Chu, J. Dai, and B. E. Bedford, in Temperature, Its Measurement and Control in Science and Industry (American Institute of Physics, New York, 1992), Vol. 6, pp. 907-912.
20. V. I. Sapritsky and A. V. Prokhorov, Metrologia 29:9 (1992).
21. F. Rosa, Y. H. Zhou, Z. M. Zhang, D. P. DeWitt, and B. K. Tsai, in Advanced in Rapid Thermal Processing, F. Roozeboom, J. C. Gelpey, M. C. Öztürk, and J. Nakos, eds. (Electrochemical Society, Pennington, NJ, 1999), Proc. Vol. 99-10, pp. 419-426.
22. M. F. Modest, Radiative Heat Transfer (McGraw-Hill, New York, 1993), Chaps. 4-7.
23. E. M. Sparrow and R. D. Cess, Radiation Heat Transfer, augmented ed. (Hemisphere, Washington, DC, 1978), Chap. 5.
24. R. Siegel and J. R. Howell, Thermal Radiation Heat Transfer, 3rd ed. (Hemisphere, Washington, DC, 1992), Chaps. 6-9.
25. F. Gervais, in Handbook of Optical Constants of Solids, E. D. Palik, ed. (Academic Press, San Diego, 1998), Vol. 2, pp. 761-776.
26. Y. J. Shen, Z. M. Zhang, B. K. Tsai, and D. P. DeWitt, Int. J. Thermophys. 22:1311 (2001).
27. Y. H. Zhou, Y. J. Shen, Z. M. Zhang, B. K. Tsai, and D. P. DeWitt, in Eighth Int. Conf. Adv. Therm. Process. Semicond.-RTP '00, Gaithersburg, MD (2000), pp. 94-103.