Bidirectional reflectance distribution function of rough silicon wafers

International Journal of Thermophysics

Volumn 22, Issue 4, 2001, Pages 1311-1326

  Shen, Y J ^a   Zhang, Z M ^a   Tsai, B K ^b   DeWitt, D P ^b  

^a UNIVERSITY OF FLORIDA   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Bidirectional reflectance distribution function (BRDF); Radiometric temperature measurement; Rapid thermal processing (RTP); Silicon wafers; Surface roughness

Indexed keywords

COMPUTER SIMULATION; INTEGRATED CIRCUITS; MATHEMATICAL MODELS; MONTE CARLO METHODS; OXIDATION; PARAMETER ESTIMATION; RAPID THERMAL ANNEALING; SURFACE ROUGHNESS;

BIDIRECTIONAL REFLECTANCE DISTRIBUTION FUNCTIONS (BRDF); PATTERNING FEATURES; RADIOMETRIC TEMPERATURE MEASUREMENTS; SURFACE SIMPLIFICATIONS;

SILICON WAFERS;

EID: 0012302887     PISSN: 0195928X     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1010636914347     Document Type: Article

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