The unusual thermal stabilization of MOCVD precursors by the dibenzoyl methanate group: Liquid injection MOVCD of tantalum oxide and niobium oxide using M(OEt)4(dbm) precursors

Chemical Vapor Deposition

Volumn 8, Issue 3, 2002, Pages 110-116

  Williams, Paul A ^a   Jones, Anthony C ^a   Wright, Peter J ^b   Crosbie, Michael J ^b   Bickley, Jamie F ^a   Steiner, Alexander ^a   Davies, Hywel O ^c   Leedham, Timothy J ^c  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b QINETIQ   (United Kingdom)

^c Inorgtech Limited   (United Kingdom)

Author keywords

Liquid injection MOVCD; Metal alkoxy diketonate complexes; Niobium oxide; Tantalum oxide

Indexed keywords

CAPACITORS; FERROELECTRIC MATERIALS; NIOBIUM COMPOUNDS; PERMITTIVITY; TANTALUM COMPOUNDS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

LIQUID INJECTION METALLORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); METAL ALKOXY-BETA-DIKETONATE COMPLEXES; NIOBIUM OXIDE; TANTALUM OXIDE;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0005473285     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(20020503)8:3<110::AID-CVDE110>3.0.CO;2-U     Document Type: Article

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