Thermal stability of a-SiNx:H films deposited by plasma electron cyclotron resonance

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1280-1284

  Martinez F L ^a   Del Prado, A ^a   Bravo, D ^b   Lopez F ^b   Martil I ^a   Gonzalez Diaz G ^a  

^a UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

^b UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004675097     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582110     Document Type: Article

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