Optical and transport properties of amorphous and microcrystalline silicon films prepared by excimer laser assisted rf glow-discharge deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 2, 1998, Pages 436-443

  Roca I Cabarrocas, P ^a   Layadi, N ^a,d   Kunst, M ^b   Clerc, C ^c   Bernas, H ^c  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b HAHN MEITNER INSTITUT   (Germany)

^c CENTRE DE CALCUL DE L INSTITUT NATIONAL DE PHYSIQUE NUCLEAIRE ET DE PHYSIQUE DES PARTICULES   (France)

^d NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032376049     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581041     Document Type: Article

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