Quantum chemical study on the oxidation process of a hydrogen terminated Si surface

Journal of Chemical Physics

Volumn 109, Issue 4, 1998, Pages 1495-1504

  Teraishi, Kazuo ^a   Takaba, Hiromitsu ^a   Yamada, Aruba ^a   Endou, Akira ^a   Gunji, Isao ^a   Chatterjee, Abhijit ^a   Kubo, Momoji ^a   Miyamoto, Akira ^a   Nakamura, Kazutaka ^b   Kitajima, Masahiro ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001636241     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.476700     Document Type: Article

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