Mechanism of H 2 desorption from H-terminated Si(001) surfaces

Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 67-71

  Watanabe, T ^a   Hoshino, T ^a   Ohdomari, I ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

Lowest energy pathway; Recombinative desorption; Semiempirical molecular orbital method; Si dihydride; TS

Indexed keywords

ACTIVATION ENERGY; ATOMS; COMPUTATIONAL METHODS; CRYSTAL ORIENTATION; DESORPTION; HYDROGEN; REACTION KINETICS; SILANES; SURFACE PHENOMENA; SURFACE STRUCTURE;

DIHYDRIDES; RECOMBINATIVE DESORPTION; SEMIEMPIRICAL MOLECULAR ORBITAL METHOD;

SEMICONDUCTING SILICON;

EID: 0031548420     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)80053-0     Document Type: Article

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