Reaction of Si (100) with silane-methane low-power plasma: SiC buffer-layer formation

Journal of Applied Physics

Volumn 86, Issue 8, 1999, Pages 4643-4648

  Bittencourt, C ^a,b  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b UNIVERSITY OF WARWICK   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001383599     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371415     Document Type: Article

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