X-ray crystal structures of bis-2,2,6,6-tetramethylheptane-3,5-dionatolead(II) and bis-2,2-dimethyl-6,6,7,7,8,8,8-heptafluorooctane-3,5-dionatolead(II): Compounds important in the metalorganic chemical vapour deposition (MOCVD) of lead-containing films

Polyhedron

Volumn 18, Issue 11, 1999, Pages 1641-1646

  Malik, M Azad ^a   O'Brien, Paul ^a   Motevalli, Majid ^b   Jones, Anthony C ^c   Leedham, Tim ^c  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

^c I   (United Kingdom)

Author keywords

Ferroelectric thin films; Volatile lead compounds; X ray crystal structures

Indexed keywords

DIMERS; FERROELECTRIC FILMS; FERROELECTRICITY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON WAFERS; SINGLE CRYSTALS; THIN FILMS;

FERROELECTRIC THIN-FILMS; FLUORINE ATOMS; LEAD CONTAINING FILMS; METAL-ORGANIC CHEMICAL VAPOUR DEPOSITIONS; MONOMERIC STRUCTURES; STEREOCHEMICALLY ACTIVE LONE PAIR OF ELECTRONS; TETRAMETHYL; VOLATILE LEAD COMPOUND; X RAY CRYSTAL STRUCTURES; X-RAY SINGLE CRYSTAL STRUCTURES;

LEAD COMPOUNDS;

EID: 0001216068     PISSN: 02775387     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0277-5387(99)00043-1     Document Type: Article

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