Study on initial growth of particles in low-pressure and low-power GeH4 RF discharges using the high-sensitivity photon-counting laser-light-scattering method

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 10 SUPPL. B, 1998, Pages

  Kawasaki, Hiroharu ^a   Sakamoto, Kazutaka ^a   Maeda, Shinichi ^a   Fukuzawa, Tsuyoshi ^a   Shiratani, Masaharu ^a   Watanabe, Yukio ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

GeH4; Laser light scattering; Low pressure; Particle; Photon counting; Plasma CVD; RF discharge; Thin films

Indexed keywords

DENSITY (SPECIFIC GRAVITY); ELECTRIC DISCHARGES; ELECTRODES; GROWTH (MATERIALS); LASER BEAMS; LIGHT SCATTERING; NUCLEATION; PARTICLE SIZE ANALYSIS; PHOTONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

GERMANE;

GERMANIUM COMPOUNDS;

EID: 0032179678     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l1264     Document Type: Article

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