Empty-space-in-silicon technique for fabricating a silicon-on-nothing structure

Applied Physics Letters

Volumn 77, Issue 20, 2000, Pages 3290-3292

  Mizushima, I ^a   Sato, T ^a   Taniguchi, S ^a   Tsunashima, Y ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000990003     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1324987     Document Type: Article

References (17)

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