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Volumn 8, Issue 2, 1996, Pages 376-381

Chemically amplified electron-beam photoresists

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001704484     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm950199s     Document Type: Article
Times cited : (24)

References (19)
  • 1
    • 0002753621 scopus 로고
    • Introduction to Microlithography
    • American Chemical Society: Washington, DC
    • Thompson, L. F.; Willson, C G.; Bowden, M. J. Introduction to Microlithography; ACS Symp. Ser. 219, American Chemical Society: Washington, DC, 1983; p 122.
    • (1983) ACS Symp. Ser. 219 , pp. 122
    • Thompson, L.F.1    Willson, C.G.2    Bowden, M.J.3
  • 4
    • 2842545585 scopus 로고
    • Materials for Microlithography
    • American Chemical Society: Washington, DC
    • (a) Tessier, T. G.; Fréchet, J. M. J., Willson, C. G. Materials for Microlithography; ACS Symp. Ser. 266; American Chemical Society: Washington, DC, 1984; p 151.
    • (1984) ACS Symp. Ser. 266 , pp. 151
    • Tessier, T.G.1    Fréchet, J.M.J.2    Willson, C.G.3
  • 11
    • 0025474902 scopus 로고
    • Ito, H. Polym. Prepr. 1990, 31(2), 375.
    • (1990) Polym. Prepr. , vol.31 , Issue.2 , pp. 375
    • Ito, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.