Dissolution inhibitors for 193-nm chemically amplified resists

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7625-7631

  Ushirogouchi, Tohru ^a   Asakawa, Koji ^a   Okino, Takeshi ^a   Shida, Naomi ^a   Kihara, Naoko ^a   Nakase, Makoto ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Alicyclic resist; ArF excimer laser; Chemically amplified resist; Dissolution inhibitor; MO calculation; Naphthalene

Indexed keywords

ADHESION; DISSOLUTION; DRY ETCHING; EXCIMER LASERS; MOLECULAR STRUCTURE; NAPHTHALENE;

ALICYCLIC RESISTS; CHEMICALLY AMPLIFIED RESISTS;

PHOTORESISTS;

EID: 0031345569     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7625     Document Type: Article

References (15)

1. M. Takahashi, S. Takechi, K. Nozaki, Y. Kaimoto and N. Abe: J. Photopolym. Sci. Technol. 7 (1994) 31.
2. R. D. Allen, G. M. Wallraff, R. A. DiPietro, D. C. Hofer and R. R. Kunz: J. Photopolym. Sci. Technol. 7 (1994) No. 3, 507.
3. K. Yamashita, M. Endo, M. Sasago, N. Nomura, H. Nagano, S. Mizuguchi, T. Ono and T. Sato: J. Vac. Sci. Technol. B 11 (1993) 2692.
4. K. Nakano, K. Maeda, S. Isawa, J. Yano, Y. Ogawa and E. Hasegawa: Proc. SPIE 2195 (1994) 194.
5. N. Shida, T. Ushirogouchi, K. Asakawa and M. Nakase: J. Photopolym. Sci. Technool. 9 (1996) 457.
6. T. Ushirogouchi, T. Naito, N. Kihara, S. Saito, T. Tada and M. Nakase: Proc. SPIE 2195 (1994) 205.
7. T. Ushirogouchi, T. Naito, K. Asakawa, N. Shida, M. Nakase and T. Tada: Polymeric Materials for Microelectronic Applications (ACS Symposium Series 1995) Vol. 614, Chap. 16.
8. T. Naito, K. Asakawa, N. Shida, T. Ushirogouchi and M. Nakase: Jpn. J. Appl. Phys. 33 (1994) 7028.
9. MOPAC93: J. J. P. Stewart, Fujitsu Ltd., Tokyo, Japan (1993).
10. MM2: U. Burkert and N. L. Allinger: Molecular Mechanics (ACS, Washington, D.C., 1982).
11. MD Calculation: For example, Molecular Dynamics and Monte Cairo method (Kodansha Scientific, Tokyo, 1994) [in Japanese].
12. K. Asakawa, T. Ushirogouchi, N. Shida, T. Okino and M. Nakase: J. Photopolym. Sci. Technol. 10 (1997) 559.
13. COSMO Method: Manual of MOPAC 93; J. J. P. Stewart, Fujitsu Ltd., Tokyo, Japan (1993).
14. K. Nozaki, K. Watanabe and E. Yano: J. Photopolym. Sci. Technol.: 9 (1996) 509.
15. S. Isawa, K. Maeda, K. Nakano and E. Hasegawa: Proc. SPIE 3049 (1997) 126.