Negative-tone resist system using vinyl cyclic acetal crosslinker

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 315-322

  Huang, Wu Song ^a   Lee, Kim Y ^a   Chen, Rex K ^a   Schepis, Dominic ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISTRY; CROSSLINKING; ELECTRON BEAM LITHOGRAPHY; PERFORMANCE; PHOTOLITHOGRAPHY; POLYMERS; THERMAL EFFECTS; ULTRAVIOLET RADIATION; X RAYS;

DEEP-ULTRAVIOLET RESISTS; NEGATIVE TONE RESISTS;

PHOTORESISTS;

EID: 0029728260     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241829     Document Type: Conference Paper

References (19)