Probabilistic model for the mechanism of phenolic polymer dissolution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 268-277

  Flanagin, Lewis W ^a   McAdams, Christopher L ^a   Tsiartas, Pavlos C ^a   Henderson, Clifford L ^a   Hinsberg, William D ^b   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Development models; Dissolution; Novolac; Phenolic polymers

Indexed keywords

DISSOLUTION; MODELS; MOLECULAR WEIGHT; PHENOLS; PHOTORESISTS; POLYMERS;

DEVELOPMENT MODELS; DIFFERENTIAL DISSOLUTIONS; DIFFUSION THEORIES; DISSOLUTION BEHAVIORS; DISSOLUTION PROCESS; DISSOLUTION RATES; LABORATORY MEASUREMENTS; NOVOLAC; PHENOL GROUPS; PHENOLIC POLYMERS; PHYSICAL ELEMENTS; POLY(HYDROXYSTYRENE); POLYMER DISSOLUTIONS; POLYMER MOLECULAR WEIGHTS; PROBABILISTIC MODELS; RESIDUAL CASTING SOLVENTS; TURBIDIMETRIC TITRATIONS;

PHENOLIC RESINS;

EID: 0000646613     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312416     Document Type: Conference Paper

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