Novolak design for high resolution positive photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 771, Issue , 1987, Pages 85-92

  Hanabata, M ^a   Furuta, A ^a   Uemura, Y ^a  

^a SUMITOMO CHEMICAL CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS, VLSI - MANUFACTURE;

DISSOLUTION INHIBITION; DISSOLUTION RATES; IMAGE FORMATION; POSITIVE PHOTORESISTS; RESOLUTION IMPROVEMENT;

PHOTORESISTS;

EID: 0023642024     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.940312     Document Type: Conference Paper

References (5)

1. M. Hanabata, A. Furuta and Y. Uemura “High Resolution Positive Photoresists” SPIE Proceedings, 1986 Vol.631, P.76.
2. Kirk-Othmer, “Encyclopedia of Chemical Technology”, Third Edition, Vol.17 P.384; V/iley-Interscience Publication, New York, 1982.
3. A. Knop and W. Scheib, “Chemistry and Application of Phenolic Resins”, Springer- Yerlag Publishing, New York, 1979.
4. G. A. Morris and R. Preeman, J.Am.Chem.Soc., 101 (1979) 760.
5. H. L. Bender, A. G. Parnham, J. W. Buyer, P. N. Apel, T. B. G-ibb, Ind.Engng.Chem. 44.1619(1952).