A membrane model for positive photoresist development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 631, Issue , 1986, Pages 124-134

  Arcus, R A ^a  

^a EASTMAN KODAK COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY - PHOTOLITHOGRAPHY; MEMBRANES;

CONCENTRATION GRADIENT; MEMBRANE MODEL; PHENOLATE; POSITIVE PHOTORESIST DEVELOPMENT;

PHOTORESISTS;

EID: 0022897613     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.963634     Document Type: Conference Paper

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