HF-chemical etching of the oxide layer near a SiO2/Si(111) interface

Applied Physics Letters

Volumn 73, Issue 26, 1998, Pages 3923-3925

  Miyata, Noriyuki ^a   Watanabe, Heiji ^a   Ichikawa, Masakazu ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000525011     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122937     Document Type: Article

References (16)

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