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Journal of Applied Physics

Volumn 87, Issue 8, 2000, Pages 3858-3863

Impact of plasma etching on the noise performance of Ti/p-Si and Ti/p-Si1-xGex Schottky contacts

(5) Ouacha, H a Mamor, M a Willander, M a Ouacha, A b Auret, F D c

a CHALMERS UNIVERSITY OF TECHNOLOGY (Sweden)

b SWEDISH DEFENCE RESEARCH AGENCY (Sweden)

c UNIVERSITY OF PRETORIA (South Africa)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000479826 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.372425 Document Type: Article

Times cited : (12)

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