Integrated plasma-promoted chemical vapor deposition route to aluminum interconnect and plug technologies for emerging computer chip metallization

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 5, 1997, Pages 1758-1766

  Faltermeier, Jonathan ^a   Knorr, Andreas ^a   Talevi, Robert ^a   Gundlach, Heidi ^a   Kumar, Kaushik Arun ^a   Peterson, Gregory G ^a   Kaloyeros, Alain E ^a   Sullivan, John J ^b   Loan, James ^b  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b MKS Instruments   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342546141     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589521     Document Type: Article

References (15)

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5. See, for example, M. E. Gross, K. P. Cheung, C. G. Fleming, J. Kovalchick, and L. A. Heimbrok, J. Vac. Sci. Technol. A 9, 1 (1991); M. E. Gross, L. H. Dubois, R. G. Nuzzo, and K. P. Cheung, Mater. Res. Soc. Symp. Proc. 204, 383 (1991); W. L. Gladfelter, D. C. Boyd, and K. F. Jensen, Chem. Mater. 1, 339 (1989); D. B. Beach, S. E. Blum, and F. K. LeGoues, J. Vac. Sci. Technol. A 7, 3117 (1989).
6. See, for example, M. E. Gross, K. P. Cheung, C. G. Fleming, J. Kovalchick, and L. A. Heimbrok, J. Vac. Sci. Technol. A 9, 1 (1991); M. E. Gross, L. H. Dubois, R. G. Nuzzo, and K. P. Cheung, Mater. Res. Soc. Symp. Proc. 204, 383 (1991); W. L. Gladfelter, D. C. Boyd, and K. F. Jensen, Chem. Mater. 1, 339 (1989); D. B. Beach, S. E. Blum, and F. K. LeGoues, J. Vac. Sci. Technol. A 7, 3117 (1989).
7. See, for example, M. E. Gross, K. P. Cheung, C. G. Fleming, J. Kovalchick, and L. A. Heimbrok, J. Vac. Sci. Technol. A 9, 1 (1991); M. E. Gross, L. H. Dubois, R. G. Nuzzo, and K. P. Cheung, Mater. Res. Soc. Symp. Proc. 204, 383 (1991); W. L. Gladfelter, D. C. Boyd, and K. F. Jensen, Chem. Mater. 1, 339 (1989); D. B. Beach, S. E. Blum, and F. K. LeGoues, J. Vac. Sci. Technol. A 7, 3117 (1989).
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